Post CMP Cleaning Market Share  2023-2032

Post CMP Cleaning Market Share  2023-2032

Aug 30, 2023

The global Post CMP Cleaning market was valued at US$ 193.6 million in 2022 and is projected to reach US$ 319.8 million by 2029, at a CAGR of 7.4% during the forecast period. The influence of COVID-19 and the Russia-Ukraine War were considered while estimating market sizes.


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Post CMP cleaning refers to the process of removing particles, residues, and contaminants from the surface of a substrate after undergoing chemical mechanical planarization (CMP). CMP is a critical step in the manufacturing of semiconductors, where it is used to create a flat and smooth surface on the substrate.


While CMP is essential for achieving the desired substrate surface, it often leaves behind residues that can negatively impact the performance and reliability of the semiconductor. Post CMP cleaning is therefore employed to effectively eliminate these residues and ensure the quality of the semiconductor.


The cleaning process typically involves using specialized cleaning solutions or chemicals, such as acidic or alkaline cleaners, to remove the residues and particles. Various techniques may be utilized, including ultrasonic cleaning, plasma cleaning, or electrochemical cleaning, depending on the specific requirements and characteristics of the semiconductor.


Total Market by Segment:

Global Post CMP Cleaning Market, by Type, 2018-2023, 2024-2029 ($ Millions) & (Tons)

Global Post CMP Cleaning Market Segment Percentages, by Type, 2022 (%)

  • Acidic Cleaners
  • Alkaline Cleaners
  • Solvent-based Cleaners



Further, the report presents profiles of competitors in the market, key players include:

  • Entegris
  • Versum Materials (Merck KGaA)
  • Mitsubishi Chemical
  • Fujifilm
  • DuPont
  • Kanto Chemical
  • BASF
  • Solexir
  • Anjimirco Shanghai
  • Honeywell International
  • Parker Hannifin
  • Technic
  • Solvay


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